Chemical vapor deposition
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Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
- See also: Wikipedia
- Related: Apollo Diamond, Atomic layer deposition, Bubbler cylinder, Carbonyl metallurgy, Ion plating
| Fundamentals of Chemical Vapor Deposition Fundamentals of Chemical Vapor Deposition www.timedomaincvd.com/CVD_Fundamentals/Fundamentals_of_CVD.html - Web |
| Traditional Coating Technologies Traditional Coating Technologies www.ngimat.com/technology/ccvd.html - Web |
| Chemical vapor deposition with atmospheric plasma Chemical vapor deposition with atmospheric plasma www.acxys.com/processes/coating - Web |
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